Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm
2018
Details
Title
Mask-aligner lithography using a continuous-wave diode laser frequency-quadrupled to 193 nm
Author(s)
Kirner, R ; Vetter, A ; Opalevs, D ; Gilfert, C ; Scholz, M ; Leisching, P ; Scharf, T ; Noell, W ; Rockstuhl, C ; Voelkel, R
Published in
Optics Express
Volume
26
Issue
2
Pages
730-743
Date
2018
Other identifier(s)
View record in Web of Science
Laboratories
NAM
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > NAM - Nanophotonics and Metrology Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2018-11-08