Effect of the Combination of Femtosecond Laser Pulses Exposure on the Etching Rate of Fused Silica in Hydrofluoric Acid
2018
Details
Title
Effect of the Combination of Femtosecond Laser Pulses Exposure on the Etching Rate of Fused Silica in Hydrofluoric Acid
Author(s)
Mouskeftaras, A ; Bellouard, Y
Published in
JOURNAL OF LASER MICRO NANOENGINEERING
Volume
13
Issue
1
Pages
26-30
Date
2018
Other identifier(s)
View record in Web of Science
Laboratories
GALATEA
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > GALATEA - Galatea Laboratory
Scientific production and competences > EPFL Partners > Neuchâtel Campus > GALATEA - Galatea Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Scientific production and competences > EPFL Partners > Neuchâtel Campus > GALATEA - Galatea Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date
2018-11-08