Amorphous gallium oxide grown by low-temperature PECVD
2018
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Details
Title
Amorphous gallium oxide grown by low-temperature PECVD
Author(s)
Kobayashi, Eiji ; Boccard, Mathieu ; Jeangros, Quentin ; Rodkey, Nathan ; Vresilovic, Daniel ; Hessler-Wyser, Aïcha ; Döbeli, Max ; Franta, Daniel ; De Wolf, Stefaan ; Morales-Masis, Monica ; Ballif, Christophe
Published in
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Volume
36
Issue
2
Pages
021518
Date
2018-03-02
Other identifier(s)
DOI: https://doi.org/10.1116/1.5018800
Laboratories
PV-LAB
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > PV-LAB - Photovoltaics and Thin Film Electronics Laboratory
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Scientific production and competences > EPFL Partners > Neuchâtel Campus > PV-Lab - Photovoltaics and Thin Film Electronics Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Grant
EU funding: 609788
EU funding: PV2050
FNS: CRSII2_154474
EU funding: PV2050
FNS: CRSII2_154474
Record creation date
2018-05-15