Notice détaillée
Titre
Puthankovilakam, Krishnaparvathy
Sciper ID
224311
Laboratoires affiliés
OPT
Publications
Intensity and phase fields behind Phase Shifting Masks studied with High Resolution Interference Microscopy
Intensity and phase fields behind phase-shifting masks studied with high-resolution interference microscopy
Light fields behind microstructures: study of the Babinet-principle in the Fresnel regime
Lightfields behind amplitude masks: Creating phase discontinuities
Limitations of Proximity Lithography Printing
Phase analysis of amplitude binary mask structures
Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization
Structured amplitude and phase fields behind microstructures: The quest for high contrast modulation at proximity
Unified rule based correction for corners in proximity lithography mask using high resolution features
Intensity and phase fields behind phase-shifting masks studied with high-resolution interference microscopy
Light fields behind microstructures: study of the Babinet-principle in the Fresnel regime
Lightfields behind amplitude masks: Creating phase discontinuities
Limitations of Proximity Lithography Printing
Phase analysis of amplitude binary mask structures
Shaping intensity behind amplitude masks for proximity correction lithography: Design, measurement and realization
Structured amplitude and phase fields behind microstructures: The quest for high contrast modulation at proximity
Unified rule based correction for corners in proximity lithography mask using high resolution features
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