Notice détaillée
Titre
Schmidt, Hannes
Sciper ID
144320
Laboratoires affiliés
SPC
Publications
Application of the shaped electrode technique to a large area rectangular capacitively coupled plasma reactor to suppress standing wave nonunifor[...]
Application of the shaped electrode technique to a large area rectangular capacitively-coupled plasma reactor to suppress standing wave nonunifor[...]
Challenges in RF plasma disposition on square-meter substrates
Characterization of a high-density large-area VHF plasma source
Characterization of a high-density, large-area VHF plasma source
Comment on "Ion energy uniformity in high-frequency capacitive discharges" [Appl. Phys. Lett. 86, 021501 (2005)]
Consequences of non-uniform RF plasma potential in large-area capacitive reactors
Elimination of electromagnetic non-uniformities in large-area RF plasma reactors used for thin-film deposition
Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor
Plasma uniformity experiments using lens-shaped electrodes in a large area VHF reactor
Voir toutes les publications (11)
Application of the shaped electrode technique to a large area rectangular capacitively-coupled plasma reactor to suppress standing wave nonunifor[...]
Challenges in RF plasma disposition on square-meter substrates
Characterization of a high-density large-area VHF plasma source
Characterization of a high-density, large-area VHF plasma source
Comment on "Ion energy uniformity in high-frequency capacitive discharges" [Appl. Phys. Lett. 86, 021501 (2005)]
Consequences of non-uniform RF plasma potential in large-area capacitive reactors
Elimination of electromagnetic non-uniformities in large-area RF plasma reactors used for thin-film deposition
Improving plasma uniformity using lens-shaped electrodes in a large area very high frequency reactor
Plasma uniformity experiments using lens-shaped electrodes in a large area VHF reactor
Voir toutes les publications (11)
Employé pour
Schmidt, H.
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