000232633 001__ 232633
000232633 005__ 20180317093929.0
000232633 0247_ $$2doi$$a10.1364/OE.21.001310
000232633 022__ $$a1094-4087
000232633 037__ $$aARTICLE
000232633 245__ $$aA compact and low loss Y-junction for submicron silicon waveguide
000232633 260__ $$bOptical Society of America$$c2013
000232633 269__ $$a2013
000232633 336__ $$aJournal Articles
000232633 520__ $$aWe designed a compact, low-loss and wavelength insensitive Y-junction for submicron silicon waveguide using finite difference time-domain (FDTD) simulation and particle swarm optimization (PSO), and fabricated the device in a 248 nm complementary metal-oxide-semiconductor (CMOS) compatible process. Measured average insertion loss is 0.28 ± 0.02 dB, uniform across an 8-inch wafer. The device footprint is less than 1.2 μm x 2 μm, an order of magnitude smaller than typical multimode interferometers (MMIs) and directional couplers.
000232633 700__ $$aZhang, Yi
000232633 700__ $$aYang, Shuyu
000232633 700__ $$aLim, Andy Eu-Jin
000232633 700__ $$aLo, Guo-Qiang
000232633 700__ $$0247423$$aGalland, Christophe$$g172230
000232633 700__ $$aBaehr-Jones, Tom
000232633 700__ $$aHochberg, Michael
000232633 773__ $$j21$$k1$$q1310$$tOptics Express
000232633 909CO $$ooai:infoscience.tind.io:232633$$particle$$pSB
000232633 909C0 $$0252619$$pLQNO$$xUM02315
000232633 917Z8 $$x173008
000232633 937__ $$aEPFL-ARTICLE-232633
000232633 973__ $$aOTHER$$rREVIEWED$$sPUBLISHED
000232633 980__ $$aARTICLE