Lowering motional resistance by partially HfO2 gap filling in double-ended tuning fork MEMS resonators.
2017
Details
Title
Lowering motional resistance by partially HfO2 gap filling in double-ended tuning fork MEMS resonators.
Author(s)
Lopez, Mariazel Maqueda ; Casu, Emanuele A. ; Ionescu, Adrian M. ; Fernandez-Bolanos, Montserrat
Published in
2017 Joint Conference of the European Frequency and Time Forum and IEEE International Frequency Control Symposium (EFTF/IFC)
Pages
805-806
Conference
2017 Joint Conference of the European Frequency and Time Forum and IEEE International Frequency Control Symposium ((EFTF/IFC), BESANÇON, France, 9-13 July 2017
Date
2017
Publisher
IEEE
Laboratories
NANOLAB
Record Appears in
Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > NANOLAB - Nanoelectronic Devices Laboratory
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Record creation date
2017-11-17