Method and Apparatus for Coating Nanoparticulate Films on Complex Substrates

Active films and processes for depositing the same onto a complex 3D shape substrates and implants are provided. The process comprises the following steps: inserting into a process chamber a sputtering target, including at least two chemical elements and a complex shape 3D substrate on a substrate holder, providing a gas to be ionized into the process chamber with a controlled pressure; applying a voltage in pulse between the sputtering target and the complex shape 3D substrate; and generating a magnetic field at the surface of the sputtering target inside the process chamber as required for HIPIMS.


Year:
2016
Other identifiers:
EPO Family ID: 50002796
TTO: 6.1319
Laboratories:




 Record created 2017-05-11, last modified 2018-03-18


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