000224428 001__ 224428
000224428 005__ 20180913064120.0
000224428 0247_ $$2doi$$a10.1016/j.proeng.2016.11.334
000224428 022__ $$a1877-7058
000224428 02470 $$2ISI$$a000391641300250
000224428 037__ $$aCONF
000224428 245__ $$aSpark discharge synthesis of semiconductor nanoparticles for thick-film metal oxide gas sensors
000224428 269__ $$a2016
000224428 260__ $$aAmsterdam$$bElsevier$$c2016
000224428 300__ $$a4
000224428 336__ $$aConference Papers
000224428 490__ $$aProcedia Engineering
000224428 520__ $$aTraditional methods of synthesis of metal-oxide gas sensing materials for semiconductor sensors are based on wet sol-gel processes. However, these processes lead to the formation of hydroxyl groups on the surface of oxide particles being responsible for the strong response of a sensing material to humidity. In this work, we investigated the possibility to synthesize metal-oxide materials with reduced sensitivity to water vapors. Dry synthesis of SnO2 nanoparticles was implemented in the gas phase by spark discharge, which allowed us to produce powder with specific surface area of about 40 m2/g after additional annealing at 610 °C. The drop of sensor resistance does not exceed 20%, when air humidity increases from 40 to 100%, whereas the response to 100 ppm of hydrogen is of a factor of 8 with very short response time of about 1 s.
000224428 6531_ $$acouches épaisses
000224428 6531_ $$athick-film technology
000224428 6531_ $$acapteurs de gaz
000224428 6531_ $$agas sensors
000224428 6531_ $$aspark discharge synthesis
000224428 6531_ $$aSPS
000224428 700__ $$aEfimov, Alexey A.
000224428 700__ $$aVolkov, Ivan A.
000224428 700__ $$aIvanov, V.V.
000224428 700__ $$aVasiliev, Alexey A.
000224428 700__ $$aVarfolomeev, A.E.
000224428 700__ $$aPislyakov, Alexandr V.
000224428 700__ $$aLagutin, Alexander S.
000224428 700__ $$aMaeder, Thomas
000224428 7112_ $$a30th Eurosensors Conference, Eurosensors 2016$$cBudapest (HU)$$d4-7.9.2016
000224428 773__ $$j168$$q1036-1039$$tProcedia Engineering
000224428 8564_ $$s440846$$uhttps://infoscience.epfl.ch/record/224428/files/Efimov%20et%20al.%20-%202016%20-%20Spark%20Discharge%20Synthesis%20of%20Semiconductor%20Nanopar.pdf$$yPublisher's version$$zPublisher's version
000224428 909C0 $$0252040$$pLMIS1$$xU10321
000224428 909CO $$ooai:infoscience.tind.io:224428$$pconf$$pSTI
000224428 917Z8 $$x102445
000224428 937__ $$aEPFL-CONF-224428
000224428 973__ $$aEPFL$$rNON-REVIEWED$$sPUBLISHED
000224428 980__ $$aCONF