000221927 001__ 221927
000221927 005__ 20190317000540.0
000221927 020__ $$a978-3-9815-3707-9
000221927 02470 $$2ISI$$a000382679200107
000221927 037__ $$aCONF
000221927 245__ $$aPanel: Looking Backwards and Forwards
000221927 269__ $$a2016
000221927 260__ $$bIEEE$$c2016$$aNew York
000221927 300__ $$a5
000221927 336__ $$aConference Papers
000221927 490__ $$aDesign, Automation, and Test in Europe Conference and Exhibition
000221927 520__ $$aTen years ago, at 90 nanometers, EDA was challenged and deemed inadequate in dealing with increasing complexity, power consumption, and sub-wavelength lithography, thus harming the progress of mobile phones. Today, at 10 nanometers, integration capacity has increased by two orders of magnitude, power consumption has been successfully "tamed", and 193 nanometer immersion lithography is still relied upon. Also thanks to EDA, tools, methodologies, and flows that were originally devised for design enablement for the emerging technology nodes, have been successfully redeployed at the established technology nodes, where they represent a critical design differentiation factor. However, the battleground is changing again: after the billions of phones, trillions of "things" lie ahead. Moving forward, emerging and established technology nodes, digital and analog, hardware and software will be equally critical. What is EDA doing and, more important, what should EDA do - and is not doing - in order for the next decade to be as great as the past one? This panel session, moderated by EPFL Professor Giovanni De Micheli, gathers academia, semiconductor, and EDA industry to discuss the challenges and requirements of the new era.
000221927 700__ $$uSynopsys, Mountain View, CA 94043 USA$$aCasale-Rossi, Marco
000221927 700__ $$0240269$$g167918$$uEcole Polytech Fed Lausanne, Lausanne, Switzerland$$aDe Micheli, Giovanni
000221927 700__ $$uSynopsys, Mountain View, CA 94043 USA$$aDomic, Antun
000221927 700__ $$uPolitecn Torino, I-10129 Turin, Italy$$aMacii, Enrico
000221927 700__ $$uSTMicroelectronics, Catania, Italy$$aRossi, Domenico
000221927 700__ $$aSawicki, Joe
000221927 7112_ $$dMarch 14-18, 2016$$cDresden, Germany$$aDesign, Automation and Test in Europe Conference and Exhibition (DATE)
000221927 773__ $$tProceedings of the 2016 Design, Automation & Test In Europe Conference & Exhibition (DATE))$$q571-575
000221927 8564_ $$uhttps://infoscience.epfl.ch/record/221927/files/07459377.pdf$$zn/a$$s120185$$yn/a
000221927 909C0 $$xU11140$$0252283$$pLSI1
000221927 909CO $$pIC$$ooai:infoscience.tind.io:221927$$qGLOBAL_SET$$pconf$$pSTI
000221927 917Z8 $$x112915
000221927 917Z8 $$x112915
000221927 937__ $$aEPFL-CONF-221927
000221927 973__ $$rREVIEWED$$sPUBLISHED$$aEPFL
000221927 980__ $$aCONF