Phenomenology of electron-beam-induced photoresist shrinkage trends
2009
Details
Title
Phenomenology of electron-beam-induced photoresist shrinkage trends
Author(s)
Bunday, Benjamin ; Cordes, Aaron ; Allgair, John ; Tileli, Vasiliki ; Avitan, Yohanan ; Peltinov, Ram ; Bar-zvi, Maayan ; Adan, Ofer ; Cottrell, Eric ; Hand, Sean
Published in
SPIE Advanced Lithography
Pages
72721B-72721B
Date
2009
Publisher
International Society for Optics and Photonics
Laboratories
INE
Record Appears in
Scientific production and competences > STI - School of Engineering > IMX - Institute of Materials > INE - Laboratory for in situ nanomaterials characterisation with electrons
Peer-reviewed publications
Work outside EPFL
Conference Papers
Published
Peer-reviewed publications
Work outside EPFL
Conference Papers
Published
Record creation date
2016-04-22