Heated mask
Xie, Shenqi; Savu, Andreea; Brugger, Juergen
2013

Abstract

The invention concerns a method and a device wherein a stencil is provided with an integrated microhotplate on the stencil membrane to prevent aperture clogging, whereby the stencil can be locally heated up in order to minimize material condensation, remove clogging and control the resolution of the deposited material by deforming the membrane towards or away from a substrate.

Details

Title Heated mask
Author(s) Xie, Shenqi ; Savu, Andreea ; Brugger, Juergen
Date 2013
Keywords
Note Alternative title(s) : (fr) Lithographie à stencil dynamique auto-nettoyante in situ à base de micro-élément chauffant (en) Microheater-based in situ self-cleaning dynamic stencil lithography
Other identifier(s) EPO Family ID: 46508121
Patent number(s) WO2012164546 (A3)
WO2012164546 (A2)
Laboratories LMIS1
TTO
Record Appears in Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LMIS1 - Microsystems Laboratory 1
Scientific production and competences > Non-academic units > TTO - Technology Transfer Office
Work produced at EPFL
Patents
Record creation date 2015-09-22

Actions