High temperature micro-hotplate

A micro-hotplate device, useful in catalytic high-temperature chemical sensors, micro-chemical reactors and as infra-red source, in particular at temperatures above 600 DEG C, comprises a thin film resistive heater (1) made of a refractory metal silicide selected from silicides of tantalum, zirconium, tungsten, molybdenum, niobium and hafnium, the silicide having a polycrystalline structure obtainalble at temperatures above 600 DEG C. The thin film resistive heater (1) is encapsulated between insulating layers (2a, 2b) forming a sandwich structure (5) and is located in a membrane (7) over an aperture (6) in a silicon substrate (4). The device is producible by standard micromachining techniques.

Other identifiers:
TTO: 6.0229
EPO Family ID: 26077359
Patent number(s):

 Record created 2015-09-22, last modified 2018-09-13

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