Stencil mask for accurate pattern replication

The stencil mask diminishes thermal effects on alignment between stencil and substrate, and reduces the overall presence of a gap between stencil and substrate. In addition, this design allows for easy interchange of stencils, making local alterations of stencil apertures possible without the necessity for the fabrication of a completely new stencil.


Year:
2007
Other identifiers:
TTO: 6.0616
EPO Family ID: 38180139
Patent number(s):
Laboratories:




 Record created 2015-09-22, last modified 2018-03-18


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