Introductory overview to: Deposition of amorphous silicon by very-high-frequency plasma-enhanced chemical vapour deposition
1989
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Title
Introductory overview to: Deposition of amorphous silicon by very-high-frequency plasma-enhanced chemical vapour deposition
Author(s)
Howling, Alan
Pagination
23
Date
1989
Publisher
CRPP, Lausanne
Keywords
Laboratories
CRPP
SPC
SPC
Record Appears in
Scientific production and competences > SB - School of Basic Sciences > SPC - Swiss Plasma Center > SPC - Swiss Plasma Center
Work produced at EPFL
Technical Reports
Work produced at EPFL
Technical Reports
Record creation date
2015-08-26