Towards fast femtosecond laser micromachining of fused silica: The effect of deposited energy

Femtosecond laser micromachining of glass material using low-energy, sub-ablation threshold pulses find numerous applications in the fields of integrated optics, lab-on-a-chips and microsystems in general. In this paper, we study the influence of the laser-deposited energy on the performance of the micromachining process. In particular, we show that the energy deposited in the substrate affects its etching rate. Furthermore, we demonstrate the existence of an optimal energy deposition value. These results are not only important from an industrial point-of-view but also provide new evidences supporting the essential role of densification and consequently stress-generation as the main driving factor promoting enhanced etching rate following laser exposure.


Published in:
Optics Express, 18, 20, 21490-21497
Year:
2010
Publisher:
Optical Society of America
ISSN:
1094-4087
Laboratories:




 Record created 2015-07-20, last modified 2018-01-28


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