000210051 001__ 210051
000210051 005__ 20180913063217.0
000210051 0247_ $$2doi$$a10.1364/OPEX.12.002120
000210051 022__ $$a1094-4087
000210051 037__ $$aARTICLE
000210051 245__ $$aFabrication of high-aspect ratio, micro-fluidic channels and tunnels using femtosecond laser pulses and chemical etching
000210051 260__ $$bOptical Society of America$$c2004
000210051 269__ $$a2004
000210051 336__ $$aJournal Articles
000210051 520__ $$aWe present novel results obtained in the fabrication of high-aspect ratio micro-fluidic microstructures chemically etched from fused silica substrates locally exposed to femtosecond laser radiation. A volume sampling method to generate three-dimensional patterns is proposed and a systematic SEM-based analysis of the microstructure is presented. The results obtained gives new insights toward a better understanding of the femtosecond laser interaction with fused silica glass (a-SiO2).
000210051 700__ $$0248800$$aBellouard, Yves$$g109297
000210051 700__ $$aSaid, Ali
000210051 700__ $$aDugan, Mark
000210051 700__ $$aBado, Philippe
000210051 773__ $$j12$$k10$$q2120-2129$$tOptics Express
000210051 909C0 $$0252537$$pGALATEA$$xU13016
000210051 909CO $$ooai:infoscience.tind.io:210051$$pSTI$$particle
000210051 917Z8 $$x144315
000210051 937__ $$aEPFL-ARTICLE-210051
000210051 973__ $$aOTHER$$rREVIEWED$$sPUBLISHED
000210051 980__ $$aARTICLE