000205728 001__ 205728
000205728 005__ 20181203023804.0
000205728 0247_ $$2doi$$a10.1016/j.apsusc.2014.09.009
000205728 022__ $$a0169-4332
000205728 02470 $$2ISI$$a000346462900021
000205728 037__ $$aARTICLE
000205728 245__ $$aSputtered titanium oxynitride coatings for endosseous applications: Physical and chemical evaluation and first bioactivity assays
000205728 260__ $$bElsevier Science Bv$$c2014$$aAmsterdam
000205728 269__ $$a2014
000205728 300__ $$a8
000205728 336__ $$aJournal Articles
000205728 520__ $$aTitanium oxynitride coatings (TiNxO3,) are considered a promising material for applications in dental implantology due to their high corrosion resistance, their biocompatibility and their superior hardness. Using the sputtering technique, TiNxO3, films with variable chemical compositions can be deposited. These films may then be set to a desired value by varying the process parameters, that is, the oxygen and nitrogen gas flows. To improve the control of the sputtering process with two reactive gases and to achieve a variable and controllable coating composition, the plasma characteristics were monitored in-situ by optical emission spectroscopy. TiNxO3, films were deposited onto commercially pure (ASTM 67) microroughened titanium plates by reactive magnetron sputtering. The nitrogen gas flow was kept constant while the oxygen gas flow was adjusted for each deposition run to obtain films with different oxygen and nitrogen contents. The physical and chemical properties of the deposited films were analyzed as a function of oxygen content in the titanium oxynitride. The potential application of the coatings in dental implantology was assessed by monitoring the proliferation and differentiation of human primary osteoblasts. (C) 2014 Elsevier B.V. All rights reserved.
000205728 6531_ $$aTitanium oxynitride coating
000205728 6531_ $$aReactive magnetron sputtering
000205728 6531_ $$aBioactivity
000205728 6531_ $$aDental implant
000205728 700__ $$uHaute Ecole Arc Ingn HES SO, Inst Appl Microtechnol, CH-2300 La Chaux De Fonds, Switzerland$$aBanakh, Oksana
000205728 700__ $$uUniv Geneva, Lab Biomat, CH-1205 Geneva, Switzerland$$aMoussa, Mira
000205728 700__ $$uHaute Ecole Arc Ingn HES SO, Inst Appl Microtechnol, CH-2300 La Chaux De Fonds, Switzerland$$aMatthey, Joel
000205728 700__ $$uHaute Ecole Arc Ingn HES SO, Inst Appl Microtechnol, CH-2300 La Chaux De Fonds, Switzerland$$aPontearso, Alessandro
000205728 700__ $$uUniv Geneva, Lab Biomat, CH-1205 Geneva, Switzerland$$aCattani-Lorente, Maria
000205728 700__ $$0244830$$g106344$$uEcole Polytech Fed Lausanne, Inst Condensed Matter Phys, CH-1015 Lausanne, Switzerland$$aSanjines, Rosendo
000205728 700__ $$aFontana, Pierre
000205728 700__ $$uUniv Geneva, Lab Biomat, CH-1205 Geneva, Switzerland$$aWiskott, Anselm
000205728 700__ $$aDurual, Stephane$$uUniv Geneva, Lab Biomat, CH-1205 Geneva, Switzerland
000205728 773__ $$j317$$tApplied Surface Science$$q986-993
000205728 909C0 $$xU10142$$0252321$$pLPMC
000205728 909CO $$pSB$$particle$$ooai:infoscience.tind.io:205728
000205728 937__ $$aEPFL-ARTICLE-205728
000205728 973__ $$rREVIEWED$$sPUBLISHED$$aEPFL
000205728 980__ $$aARTICLE