000203352 001__ 203352
000203352 005__ 20181203023705.0
000203352 0247_ $$2doi$$a10.1088/0957-4484/23/1/015603
000203352 022__ $$a09574484
000203352 037__ $$aARTICLE
000203352 245__ $$aEmbedded layer of Ag nanoparticles prepared by a combined PECVD/PVD process producing SiO xC y-Ag nanocomposite thin films
000203352 260__ $$c2012
000203352 269__ $$a2012
000203352 336__ $$aJournal Articles
000203352 520__ $$aStructural properties of SiO xC y-Ag nanocomposite thin films prepared by a dual process PVD-PECVD in the same reactor have been investigated. The experimental results have demonstrated the influence of a PECVD process carried out at room temperature for the growth of a dielectric matrix on the size and the distribution density of Ag nanoparticles (NPs) deposited beforehand by magnetron sputtering. The plasma during the growth of the encapsulation SiO xC y layer caused a diffusion of silver from NPs through the SiO xC y matrix associated with a decrease in the average size of nanoparticles and an increase of their distribution density. Silver diffusion is blocked at a barrier interface to form a buried layer of individual Ag NPs which, for instance, can find plasmonic applications. Silver also diffuses toward the outer surface inducing antibacterial properties. In both cases initial Ag NPs act as reservoirs for multifunctional properties of advanced nanostructured films.
000203352 6531_ $$aAg nanoparticle
000203352 6531_ $$aAntibacterial properties
000203352 6531_ $$aAverage size
000203352 6531_ $$aBuried layer
000203352 6531_ $$aDielectric matrixes
000203352 6531_ $$aDistribution density
000203352 6531_ $$aDual process
000203352 6531_ $$aEmbedded layers
000203352 6531_ $$aFilm preparation
000203352 6531_ $$amatrix
000203352 6531_ $$aMultifunctional properties
000203352 6531_ $$aNanocomposite films
000203352 6531_ $$aNanocomposites
000203352 6531_ $$aNanocomposite thin films
000203352 6531_ $$aNanoparticles
000203352 6531_ $$aNanostructured Films
000203352 6531_ $$aOuter surface
000203352 6531_ $$aPlasmonic
000203352 6531_ $$aRoom temperature
000203352 6531_ $$aSilicon compounds
000203352 6531_ $$aSilver
000203352 6531_ $$aSilver diffusion
000203352 6531_ $$aThin films
000203352 700__ $$aBedel, L.
000203352 700__ $$0248450$$g112215$$aCayron, C.
000203352 700__ $$aJouve, M.
000203352 700__ $$aMaury, F.
000203352 773__ $$j23$$tNanotechnology
000203352 909C0 $$xU12903$$0252516$$pLMTM
000203352 909CO $$pSTI$$particle$$ooai:infoscience.tind.io:203352
000203352 937__ $$aEPFL-ARTICLE-203352
000203352 973__ $$rREVIEWED$$sPUBLISHED$$aOTHER
000203352 980__ $$aARTICLE