000199678 001__ 199678
000199678 005__ 20181203023520.0
000199678 0247_ $$2doi$$a10.1016/j.jelechem.2014.01.038
000199678 022__ $$a1572-6657
000199678 02470 $$2ISI$$a000335112200036
000199678 037__ $$aARTICLE
000199678 245__ $$aA novel approach for the preparation of textured CuO thin films from electrodeposited CuCl and CuBr
000199678 260__ $$aLausanne$$bElsevier$$c2014
000199678 269__ $$a2014
000199678 300__ $$a7
000199678 336__ $$aJournal Articles
000199678 520__ $$aWe report on the electrodeposition of CuX (X = Cl, Br) thin films on fluorine-doped tin oxide (FTO) electrodes. The electrodeposited CuX thin films, for the first time, were used as intermediates to prepare CuO thin films. Calcination of the as-prepared CuX thin films at temperatures above 380 degrees C allowed us to produce CuO thin films, which were used in photoelectrochemical (PEC) studies. The highest recorded photocurrent density of similar to 1.3 mA/cm(2) at -0.55 V (vs. Ag/AgCl) in aqueous solution was obtained from the CuO sample calcined at 460 degrees C. Here, we showed that the photocurrent in the unprotected CuO electrode originates from corrosion, formation of Cu2O and Cu phases, and not from water-splitting process as it has been claimed in literature. In addition, the electrochemical impedance spectroscopy allowed us to obtain the flat-band potentials of the CuO films. (C) 2014 Elsevier B.V. All rights reserved.
000199678 6531_ $$aElectrodeposition
000199678 6531_ $$aThin film
000199678 6531_ $$aPhotoelectrochemical cell
000199678 6531_ $$aWater splitting
000199678 6531_ $$aSolar fuels
000199678 700__ $$aEmin, S.$$uUniv Nova Gorica, Mat Res Lab, SI-5000 Nova Gorica, Slovenia
000199678 700__ $$aAbdi, F. F.$$uDelft Univ Technol, Dept Chem Engn, NL-2600 GA Delft, Netherlands
000199678 700__ $$aFanetti, M.$$uUniv Nova Gorica, Mat Res Lab, SI-5000 Nova Gorica, Slovenia
000199678 700__ $$aPeng, W.$$uNatl Inst Mat Sci, Photovolta Mat Unit, Tsukuba, Ibaraki 3050047, Japan
000199678 700__ $$aSmith, W.$$uDelft Univ Technol, Dept Chem Engn, NL-2600 GA Delft, Netherlands
000199678 700__ $$0244210$$aSivula, K.$$g178220$$uEcole Polytech Fed Lausanne, Inst Chem & Chem Engn, CH-1015 Lausanne, Switzerland
000199678 700__ $$aDam, B.$$uDelft Univ Technol, Dept Chem Engn, NL-2600 GA Delft, Netherlands
000199678 700__ $$aValant, M.$$uUniv Nova Gorica, Mat Res Lab, SI-5000 Nova Gorica, Slovenia
000199678 773__ $$j717$$q243-249$$tJournal Of Electroanalytical Chemistry
000199678 909C0 $$0252414$$pLIMNO$$xU12534
000199678 909CO $$ooai:infoscience.tind.io:199678$$pSB$$particle
000199678 917Z8 $$x178220
000199678 937__ $$aEPFL-ARTICLE-199678
000199678 973__ $$aEPFL$$rREVIEWED$$sPUBLISHED
000199678 980__ $$aARTICLE