000199013 001__ 199013
000199013 005__ 20180913062518.0
000199013 0247_ $$2doi$$a10.1016/j.tsf.2014.02.079
000199013 022__ $$a0040-6090
000199013 02470 $$2ISI$$a000334314100015
000199013 037__ $$aARTICLE
000199013 245__ $$aTaSiN nanocomposite thin films: Correlation between structure, chemical composition, and physical properties
000199013 260__ $$aLausanne$$bElsevier Science Sa$$c2014
000199013 269__ $$a2014
000199013 300__ $$a8
000199013 336__ $$aJournal Articles
000199013 520__ $$aThe structural and electronic properties of fcc-TaN/SiNx nanocomposite thin films deposited by reactive magnetron sputtering have been investigated as function of the N and Si contents. Our studies have been mainly focused on three different types of nanocomposite TaxSiyNz films based on: nitrogen deficient fcc-TaN0.88, nearly stoichiometric fcc-TaN, and over-stoichiometric fcc-TaN1.2 with the Si contents in the range from 0 to about 15 at.%. The optical properties were investigated by ellipsometric measurements, while the DC. electrical resistivity was measured using the van der Pauw configuration at 300 K. The optical measurements were interpreted using the standard Drude-Lorentz model. The results showed that the electronic properties are closely correlated with both the compositional and the structural modifications of the TaxSiyNz films induced by the addition of Si atoms, and also depending on the stoichiometry of the starting fcc-TaN system. Thus, depending on both the nitrogen and the silicon contents, the fcc-TaxSiyNz films can exhibit room temperature resistivity values ranging from 10(2) mu Omega cm to about 6 x 10(4) mu Omega cm. Published by Elsevier B.V.
000199013 6531_ $$aTantalum nitride
000199013 6531_ $$aSilicon nitride
000199013 6531_ $$aThin films
000199013 6531_ $$aOptical properties
000199013 6531_ $$aElectrical properties
000199013 6531_ $$aNanocomposites
000199013 700__ $$aRamirez, G.$$uArgonne Natl Lab, Div Energy Syst, Argonne, IL 60439 USA
000199013 700__ $$0244816$$aOezer, D.$$g147739$$uEcole Polytech Fed Lausanne, Inst Condensed Matter Phys, CH-1015 Lausanne, Switzerland
000199013 700__ $$aRivera, M.
000199013 700__ $$aRodil, S. E.$$uUniv Nacl Autonoma Mexico, Inst Invest Mat, Mexico City 04510, DF, Mexico
000199013 700__ $$0244830$$aSanjines, R.$$g106344$$uEcole Polytech Fed Lausanne, Inst Condensed Matter Phys, CH-1015 Lausanne, Switzerland
000199013 773__ $$j558$$q104-111$$tThin Solid Films
000199013 909C0 $$0252321$$pLPMC$$xU10142
000199013 909CO $$ooai:infoscience.tind.io:199013$$pSB$$particle
000199013 937__ $$aEPFL-ARTICLE-199013
000199013 973__ $$aEPFL$$rREVIEWED$$sPUBLISHED
000199013 980__ $$aARTICLE