Pb(Zr,Ti)O3 thin films by in-situ reactive sputtering on micromachined membranes for micromechanical applications

For micromechanical applications, piezoelectric PbZrTO3 (PZT) thin films have been deposited on metallised Si3N4/SiO2 layers on Si wafers. Films with compositions near the morphotropic phase boundary (x=0.53) were prepared at 600°C using a multitarget, in-situ, reactive deposition process. The PZT films were optimised with respect to Pb/(Zr+Ti) flux and Zr content. Within certain processing limits, the lead content was found to be self-stabilising, e.g. any excess lead re-evaporated from the substrate, resulting in essentially single phase films. The crystallisation and orientation were improved by the presence of a PbTiO3 - rich seed layer, which allowed the deposition of films with >95% <100>/<001> orientation. Membranes with piezoelectric films were micromachined by chemically etching the Si substrate. The piezoelectric response, i.e. the deflections, of the resulting membranes were measured as a function of applied voltage and frequency using an interferometer.


Editor(s):
Lee, W. E.
Published in:
Ceramic Films and Coatings, 207-218
Presented at:
Ceramic films and coatings, Sheffield (UK), 19-20.12.1994
Year:
1995
Publisher:
The Institute of Materials / Maney Publishing
ISBN:
978-0-901716-79-8
Keywords:
Laboratories:


Note: The status of this file is: EPFL only


 Record created 2014-05-20, last modified 2018-04-29

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