In-Situ Thin Film Growth of PbTiO3 By Multi Target Sputtering

The in-situ reactive sputter deposition of PbTiO3 on Pt/Ti/SiO2/Si from two metallic targets was investigated. A minimal lead oxide flux of two to three times the titanium oxide flux is needed in order to obtain stoichiometric films with the perovskite structure. For higher fluxes, the Pb/Ti ratio in the film stays at the stoichiometric value 1; the orientation changes from random to <100>; and the film morphology transforms from a rough to a smooth polycrystalline film. The obtained dielectric constants vary between 40 and 150, the losses between 2 and 4 % (10 kHz). The method could be extended to PbZrxTi1-xO3 for x ≤ 0.7. The orientation is lost when the Pt electrodes are replaced by RuO2 electrodes.


Editor(s):
Fork, David K.
Phillips, Julia M.
Ramesh, R.
Wolf, Ronald M.
Published in:
MRS Proceedings, 341, 361-366
Presented at:
1994 MRS Spring Meeting, San Francisco, USA, 5-10.4.1994
Year:
1994
Publisher:
Cambridge, Cambridge University Press
Keywords:
Note:
Conférence San Francisco, USA ; symposium F, eds. David K. Fork, Julia M. Phillips, R. Ramesh, Ronald M. Wolf
Laboratories:




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