000187905 001__ 187905
000187905 005__ 20190709195706.0
000187905 022__ $$a0167-9317
000187905 0247_ $$2doi$$a10.1016/j.mee.2007.01.078
000187905 02470 $$2ISI$$a000247182500104
000187905 037__ $$aARTICLE
000187905 245__ $$aDRIE based novel technique for AFM probes fabrication
000187905 269__ $$a2007
000187905 260__ $$c2007
000187905 336__ $$aJournal Articles
000187905 500__ $$aVillanueva, G CSIC, CNM, IMB, Campus UAB, Bellaterra 08193, Spain CSIC, CNM, IMB, Bellaterra 08193, Spain
000187905 500__ $$a177WF
000187905 500__ $$aTimes Cited:0
000187905 500__ $$aCited References Count:25
000187905 520__ $$aWe report on the fabrication of atomic force microscopy (AFM) probes using a novel technology that performs every machining step by means of one single deep reactive ion etching (DRIE) equipment. Specific etching conditions are optimized in order to define rocket tips (apex and shaft parts of the tip are etched separately). Then, those rocket tips are fabricated on cantilevers obtaining finally complete AFM probes. DRIE is also used to shape the cantilevers and to machine the whole silicon wafer. Very high yield and very high uniformity are obtained because of the use of dry etchings. Customized fabrication of AFM probes with similar features than the reference ones is demonstrated. (c) 2007 Elsevier B.V. All rights reserved.
000187905 6531_ $$aafm probes
000187905 6531_ $$adrie
000187905 6531_ $$aatomic-force microscope
000187905 6531_ $$alocal oxidation
000187905 6531_ $$asilicon
000187905 6531_ $$atips
000187905 6531_ $$aoscillation
000187905 6531_ $$aaccess
000187905 6531_ $$amodes
000187905 700__ $$0240380$$g176631$$aVillanueva, G.
000187905 700__ $$aPlaza, J. A.
000187905 700__ $$aSanchez, A.
000187905 700__ $$aZinoviev, K.
000187905 700__ $$aPerez-Murano, F.
000187905 700__ $$aBausells, J.
000187905 773__ $$j84$$tMicroelectronic Engineering$$k5-8$$q1132-1135
000187905 909C0 $$xU12739$$0252546$$pNEMS
000187905 909CO $$qGLOBAL_SET$$pSTI$$particle$$ooai:infoscience.tind.io:187905
000187905 937__ $$aEPFL-ARTICLE-187905
000187905 973__ $$rREVIEWED$$sPUBLISHED$$aOTHER
000187905 980__ $$aARTICLE