DRIE based novel technique for AFM probes fabrication

We report on the fabrication of atomic force microscopy (AFM) probes using a novel technology that performs every machining step by means of one single deep reactive ion etching (DRIE) equipment. Specific etching conditions are optimized in order to define rocket tips (apex and shaft parts of the tip are etched separately). Then, those rocket tips are fabricated on cantilevers obtaining finally complete AFM probes. DRIE is also used to shape the cantilevers and to machine the whole silicon wafer. Very high yield and very high uniformity are obtained because of the use of dry etchings. Customized fabrication of AFM probes with similar features than the reference ones is demonstrated. (c) 2007 Elsevier B.V. All rights reserved.


Publié dans:
32nd International Conference on Micro- and Nano- Engineering (MNE), 84, 5-8, 1132-1135
Présenté à:
32nd International Conference on Micro- and Nano- Engineering (MNE), Barcelona, Spain, 2006
Année
2006
ISSN:
0167-9317
Mots-clefs:
Laboratoires:




 Notice créée le 2013-08-06, modifiée le 2019-08-12


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