Fabrication of nanoelectrodes combining standard microfabrication processes and focused ion beam (FIB)

We present a method for the production of nanoelectrodes using focussed ion beam techniques (FIB). The electrodes utilise nanometric holes milled in a silicon nitride based pasivation layer, followed by wet etching of a silicon oxide based pasivation layer, to expose an underlying gold electrode. After functionalisation using a surface assembled monolayer and an electrochemically grown polypyrrole, these gold nanoelectrodes have been tested, via cyclic voltammetry, in the detection of [Fe(CN)6]4-/3- ions. The nanoelectrodes will be used to investigate the electrical properties of nanometric biological specimen.


Presented at:
Trends in Nanotechnology (TNT), Segovia, 2004
Year:
2004
Keywords:
Laboratories:




 Record created 2013-08-06, last modified 2018-03-17


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