Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments
Dabirian, Ali; Kuzminykh, Yury; Wagner, Estelle; Benvenuti, Giacomo; Rushworth, Simon A.; Hoffmann, Patrik
2011

Abstract

Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and desorption-limited conditions appear to be the ideal environment for spatially addressable combinatorial experiments (see picture). Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.

Details

Title Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments
Author(s) Dabirian, Ali ; Kuzminykh, Yury ; Wagner, Estelle ; Benvenuti, Giacomo ; Rushworth, Simon A. ; Hoffmann, Patrik
Published in Chemphyschem
Volume 12
Pages 3524-3528
Date 2011
Keywords
DOI https://doi.org/10.1002/cphc.201100637
Other identifier(s) View record in Web of Science
Laboratories LOA
LPMAT
Record Appears in Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LPMAT - Laboratory for Photonic Materials and Characterization
Scientific production and competences > STI - School of Engineering > STI Archives > LOA - Advanced Photonics Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date 2012-06-25

Actions