Chemical Vapor Deposition Kinetics and Localized Growth Regimes in Combinatorial Experiments

Laser-assisted deposition: The discovery of chemical vapor deposition (CVD) conditions under which the growth rate is a decreasing function of the precursor flux has the potential to boost the resolution of laser-assisted CVD processes whereas flux- and desorption-limited conditions appear to be the ideal environment for spatially addressable combinatorial experiments (see picture). Copyright © 2011 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim.


Published in:
Chemphyschem, 12, 3524-3528
Year:
2011
Keywords:
Laboratories:




 Record created 2012-06-25, last modified 2018-03-18


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