Breaking the diffraction limit with plasmon optics: 20 nm optical lithography using 600 nm illumination wavelength


Published in:
Proc. Micro- and nano engineering, 1, 98-99
Presented at:
Micro- and nano engineering, Lugano, Switzerland, September 16-19 2002
Year:
2002
Keywords:
Laboratories:




 Record created 2012-02-14, last modified 2018-09-13


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