205-GHz (Al,In)N/GaN HEMTs
We report 55-nm gate AlInN/GaN high-electron-mobility transistors (HEMTs) featuring a short-circuit current gain cutoff frequency of f(T) = 205 GHz at room temperature, a new record for GaN-based HEMTs. The devices source a maximum current density of 2.3 A/mm at V-GS = 0 V and show a measured transconductance of 575 mS/mm, which is the highest value reported to date for nonrecessed gate nitride HEMTs. Comparison to state-of-the-art thin-barrier AlGaN/GaN HEMTs suggests that AlInN/GaN devices benefit from an advantageous channel velocity under high-field transport conditions.
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Sun, H., Alt, A. R., Benedickter, H., Feltin, E., Carlin, J.-F., Gonschorek, M., Grandjean, N. R., & Bolognesi, C. R. (2010). 205-GHz (Al,In)N/GaN HEMTs. IEEE Electron Device Letters, 31, 957–959. https://doi.org/10.1109/LED.2010.2055826
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WOS:000283185500019
2010
31
957
959
REVIEWED
OTHER