Efficient optimization of high vacuum chemical vapor deposition of niobium oxide on full wafer scale

Dabirian, A.; Kuzminykh, Yury; Harada, S.; Parsons, C.; Sandu, S. C.; Wagner, E.; Benvenuti, G.; Rushworth, S.; Muralt, P.; Hoffmann, P.

doi:10.1088/1757-899X/8/1/012026

Dabirian, A.; Kuzminykh, Yury; Harada, S.; Parsons, C.; Sandu, S. C.; Wagner, E.; Benvenuti, G.; Rushworth, S.; Muralt, P.; Hoffmann, P.

2010

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Résumé

A systematic study of niobium oxide deposition using niobium tetraethoxy-dimethyl-amino-ethoxide (Nb(OEt)(4)(dmae)) precursor is presented. The deposition process was conducted in a high-vacuum chemical vapor deposition machine with precursor flux gradient capability. An efficient optimization of the deposition process was achieved and both mass-transport- and chemical-reaction-limited regimes were identified.

Détails

Titre Efficient optimization of high vacuum chemical vapor deposition of niobium oxide on full wafer scale

Auteur(s) Dabirian, A. ; Kuzminykh, Yury ; Harada, S. ; Parsons, C. ; Sandu, S. C. ; Wagner, E. ; Benvenuti, G. ; Rushworth, S. ; Muralt, P. ; Hoffmann, P.

Publié dans Fundamentals And Technology Of Multifunctional Oxide Thin Films (Symposium G, Emrs 2009 Spring Meeting)

Série IOP Conference Series-Materials Science and Engineering

Volume 8

Pages 012026

Présenté à Conference on Fundamentals and Technology of Multifunctional Oxide Thin Films (Symposium G, EMRS 2009 Spring Meeting), Strasbourg, FRANCE, Jun 08-12, 2009

Date 2010

Editeur Iop Publishing Ltd, Dirac House, Temple Back, Bristol Bs1 6Be, England

Mots-clés (libres)

Thin-Films; Solar-Cells; Nb2O5

DOI https://doi.org/10.1088/1757-899X/8/1/012026

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