000171409 001__ 171409
000171409 005__ 20181203022532.0
000171409 0247_ $$2doi$$a10.1088/0022-3727/44/23/232001
000171409 02470 $$2ISI$$a000290911400001
000171409 037__ $$aARTICLE
000171409 245__ $$aHigh-resolution hard-x-ray microscopy using second-order zone-plate diffraction
000171409 269__ $$a2011
000171409 260__ $$c2011
000171409 336__ $$aJournal Articles
000171409 520__ $$aOdd-order diffraction of zone plates (ZPs) is already used for x-ray microscopy but the potential offered by even-order diffraction must still be fully exploited. Width differences between lines and interline spaces transfer intensity from odd-order to even-order diffractions. Here we show that the resulting intense second-order diffraction provides a reasonable tradeoff between spatial resolution and intensity-and constitutes a viable strategy for x-ray microscopy to reach sub-20 nm resolution, in spite of the imperfections of high-aspect-ratio ZPs and of other difficulties.
000171409 6531_ $$aE-Beam Lithography
000171409 6531_ $$aFabrication
000171409 6531_ $$aCIBM-PC
000171409 700__ $$aYi, Jaemock
000171409 700__ $$aChu, Yong S.
000171409 700__ $$aChen, Yu-Tung
000171409 700__ $$aChen, Tsung-Yu
000171409 700__ $$aHwu, Y.
000171409 700__ $$0240179$$aMargaritondo, G.$$g105753
000171409 773__ $$j44$$q-$$tJournal Of Physics D-Applied Physics
000171409 909C0 $$0252163$$pLPRX$$xU10144
000171409 909C0 $$0252477$$pCIBM$$xU12623
000171409 909CO $$ooai:infoscience.tind.io:171409$$pSB$$particle
000171409 917Z8 $$x105753
000171409 917Z8 $$x161735
000171409 937__ $$aEPFL-ARTICLE-171409
000171409 973__ $$aEPFL$$rREVIEWED$$sPUBLISHED
000171409 980__ $$aARTICLE