A gradient-descent method for the run-to-run tuning of MPC controllers is proposed. It is shown that, with an assumption on process repeatability, the MPC tuning parameters may be brought to a locally optimal set. SISO and MIMO examples illustrate the characteristics of the proposed approach.
Title
Run-to-Run MPC Tuning via Gradient Descent
Published in
Computer-Aided Chemical Engineering
Pagination
5
Series
Computer-Aided Chemical Engineering
Volume
30
Pages
927-931
Conference
22nd European Symposium on Computer Aided Process Engineering (ESCAPE), London, UK, June 17-20, 2012
Date
2012
Publisher
Amsterdam, Elsevier
ISBN
978-0-444-59520-1
Record creation date
2011-11-24