000167381 001__ 167381
000167381 005__ 20180913060717.0
000167381 0247_ $$2doi$$a10.1016/j.proche.2009.07.106
000167381 037__ $$aCONF
000167381 245__ $$aNEMS/CMOS sensor for monitoring deposition rates in stencil lithography
000167381 269__ $$a2009
000167381 260__ $$bElsevier$$c2009
000167381 336__ $$aConference Papers
000167381 520__ $$aA nanoelectromechanical mass sensor is used to characterize material deposition rates in stencil lithography. The material flux through micron size apertures is mapped with high spatial (below 1 μm) and deposition rate (below 10 pm/s) resolutions by displacing the stencil apertures over the sensor. The sensor is based on a resonating metallic beam (with submicron size width and thickness) monolithically integrated with a CMOS circuit, resulting in a CMOS/NEMS self-oscillator. The sensor is used to test alignment for multi-level nanostencil lithography.
000167381 6531_ $$aNanomechanical mass sensors
000167381 6531_ $$aCMOS sensors
000167381 6531_ $$ananostencil lithography
000167381 6531_ $$ananolithography
000167381 700__ $$aSansa, Marc
000167381 700__ $$aArcamone, Julien
000167381 700__ $$aVerd, Jaume
000167381 700__ $$aUranga, Arantxa
000167381 700__ $$aAbadal, Gabriel
000167381 700__ $$aNúria, Barniol
000167381 700__ $$0245968$$aSavu, Veronica$$g176597
000167381 700__ $$0240119$$avan den Boogaart, Marc$$g152156
000167381 700__ $$0240120$$aBrugger, Jürgen$$g145781
000167381 700__ $$aPerez-Murano, Francesc
000167381 7112_ $$aEurosensor XXIII conference$$cLausanne, Switzerland$$dSeptember 6-9, 2009
000167381 773__ $$j1$$q425-428$$tProcedia Chemistry
000167381 8564_ $$s789481$$uhttps://infoscience.epfl.ch/record/167381/files/Sansa_ProcChem_2009.pdf$$yn/a$$zn/a
000167381 909C0 $$0252040$$pLMIS1$$xU10321
000167381 909CO $$ooai:infoscience.tind.io:167381$$pconf$$pSTI
000167381 917Z8 $$x196902
000167381 937__ $$aEPFL-CONF-167381
000167381 973__ $$aOTHER$$rREVIEWED$$sPUBLISHED
000167381 980__ $$aCONF