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conference paper
NEMS/CMOS sensor for monitoring deposition rates in stencil lithography
2009
Procedia Chemistry
A nanoelectromechanical mass sensor is used to characterize material deposition rates in stencil lithography. The material flux through micron size apertures is mapped with high spatial (below 1 μm) and deposition rate (below 10 pm/s) resolutions by displacing the stencil apertures over the sensor. The sensor is based on a resonating metallic beam (with submicron size width and thickness) monolithically integrated with a CMOS circuit, resulting in a CMOS/NEMS self-oscillator. The sensor is used to test alignment for multi-level nanostencil lithography.
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Name
Sansa_ProcChem_2009.pdf
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openaccess
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770.98 KB
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Adobe PDF
Checksum (MD5)
8c15668218bc422f99895601b870696a