NEMS/CMOS sensor for monitoring deposition rates in stencil lithography
Sansa, Marc; Arcamone, Julien; Verd, Jaume; Uranga, Arantxa; Abadal, Gabriel; Núria, Barniol; Savu, Veronica; van den Boogaart, Marc; Brugger, Jürgen; Perez-Murano, Francesc
2009

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Abstract

A nanoelectromechanical mass sensor is used to characterize material deposition rates in stencil lithography. The material flux through micron size apertures is mapped with high spatial (below 1 μm) and deposition rate (below 10 pm/s) resolutions by displacing the stencil apertures over the sensor. The sensor is based on a resonating metallic beam (with submicron size width and thickness) monolithically integrated with a CMOS circuit, resulting in a CMOS/NEMS self-oscillator. The sensor is used to test alignment for multi-level nanostencil lithography.

Details

Title NEMS/CMOS sensor for monitoring deposition rates in stencil lithography
Author(s) Sansa, Marc ; Arcamone, Julien ; Verd, Jaume ; Uranga, Arantxa ; Abadal, Gabriel ; Núria, Barniol ; Savu, Veronica ; van den Boogaart, Marc ; Brugger, Jürgen ; Perez-Murano, Francesc
Published in Procedia Chemistry
Volume 1
Pages 425-428
Conference Eurosensor XXIII conference, Lausanne, Switzerland, September 6-9, 2009
Date 2009
Publisher Elsevier
Keywords
DOI https://doi.org/10.1016/j.proche.2009.07.106
Laboratories LMIS1
Record Appears in Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LMIS1 - Microsystems Laboratory 1
Peer-reviewed publications
Work outside EPFL
Conference Papers
Published
Record creation date 2011-07-05

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