000167215 001__ 167215
000167215 005__ 20180913060713.0
000167215 0247_ $$2doi$$a10.1016/j.cej.2010.08.002
000167215 02470 $$2ISI$$a000283449400017
000167215 037__ $$aARTICLE
000167215 245__ $$aAdvanced oxidation of the surfactant SDBS by means of hydroxyl and sulphate radicals
000167215 269__ $$a2010
000167215 260__ $$c2010
000167215 336__ $$aJournal Articles
000167215 520__ $$aThe objective of the present study was to characterize the removal of the model surfactant sodium dodecylbenzene sulfonate (SDBS) from waters using several radical-based water treatment processes. Fenton's reagent has shown high efficacy in surfactant degradation at pH 2 but does not mineralize the dissolved contaminant and is ineffective at pH 7. Due to a low quantum yield (phi < 0.12 mol(-1) Einstein(-1)), direct photooxidation is not very effective to remove SDBS from aqueous solutions. The presence of H2O2 and K2S2O8 during irradiation generates highly oxidizing radicals that enhance the SDBS degradation rate by radical-based oxidation processes. The UV/K2S2O8 system is the most effective process, because this process can produce the generation of SO4 center dot- and HO center dot radical for SOBS oxidation. Moreover, the results obtained in the presence of HO center dot radical scavengers could indicate that SO4 center dot- is more selective than HO center dot radicals. For a UV dose of 400J m(-2) the depletion yields determined were 0.4%, 15.6% and 27.8% for UV, UV/H2O2 ([H2O2] = 300 mu M) and UV/K2S2O8 ([K2S2O8] = 300 mu M) respectively, confirming that UV/K2S2O8 process is the most efficient to oxidize SDBS. (C) 2010 Elsevier B.V. All rights reserved.
000167215 6531_ $$aAdvanced oxidation
000167215 6531_ $$aPhotolysis
000167215 6531_ $$aSodium dodecylbenzene sulfonate
000167215 6531_ $$aSulphate radicals
000167215 6531_ $$aHydroxyl radicals
000167215 6531_ $$aWaste-Water Treatment
000167215 6531_ $$aHydrogen-Peroxide
000167215 6531_ $$aAqueous-Solutions
000167215 6531_ $$aRate Constants
000167215 6531_ $$aAnionic Surfactants
000167215 6531_ $$aFenton Oxidation
000167215 6531_ $$aDegradation
000167215 6531_ $$aOzonation
000167215 6531_ $$aPersulfate
000167215 6531_ $$aPhotolysis
000167215 700__ $$aMendez-Diaz, J.
000167215 700__ $$aSanchez-Polo, M.
000167215 700__ $$aRivera-Utrilla, J.
000167215 700__ $$aCanonica, S.
000167215 700__ $$0245482$$avon Gunten, U.$$g210253
000167215 773__ $$j163$$q300-306$$tChemical Engineering Journal
000167215 909C0 $$0252250$$pLTQE$$xU12400
000167215 909CO $$ooai:infoscience.tind.io:167215$$particle$$pENAC
000167215 937__ $$aEPFL-ARTICLE-167215
000167215 973__ $$aOTHER$$rREVIEWED$$sPUBLISHED
000167215 980__ $$aARTICLE