Energy flow in light-coupling masks for lensless optical lithography
Piller, N. B.; Schmid, H.; Biebuyck, H.; Michel, B.; Martin, O. J. F.
1998

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Abstract

We illustrate the propagation of light in a new type of coupling mask for lensless optical lithography. Our investigation shows how the different elements comprising such masks contribute to the definition of an optical path that allows the exposure of features in the 100-nm-size range in the photoresist. (C) 1998 Optical Society of America

Details

Title Energy flow in light-coupling masks for lensless optical lithography
Author(s) Piller, N. B. ; Schmid, H. ; Biebuyck, H. ; Michel, B. ; Martin, O. J. F.
Published in Optics Express
Volume 3
Pages 280-285
Date 1998
Publisher Optical Society of America
ISSN 1094-4087
DOI https://doi.org/10.1364/OE.3.000280
Other identifier(s) View record in Web of Science
Laboratories NAM
Record Appears in Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > NAM - Nanophotonics and Metrology Laboratory
Peer-reviewed publications
Work produced at EPFL
Journal Articles
Published
Record creation date 2011-04-11

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