Position controlled self-catalyzed growth of GaAs nanowires by molecular beam epitaxy

GaAs nanowires are grown by molecular beam epitaxy using a self-catalyzed, Ga-assisted growth technique. Position control is achieved by nano-patterning a SiO2 layer with arrays of holes with a hole diameter of 85 nm and a hole pitch varying between 200 nm and 2 mu m. Gallium droplets form preferentially at the etched holes acting as catalyst for the nanowire growth. The nanowires have hexagonal cross-sections with {110} side facets and crystallize predominantly in zincblende. The interdistance dependence of the nanowire growth rate indicates a change of the III/V ratio towards As-rich conditions for large hole distances inhibiting NW growth


Published in:
Nanotechnology, 21, 435601
Year:
2010
Publisher:
Institute of Physics
ISSN:
0957-4484
Keywords:
Laboratories:




 Record created 2011-03-05, last modified 2018-03-17

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