Nanoimprint Lithography for High-Efficiency Thin-Film Silicon Solar Cells

We demonstrate high-efficiency thin-film silicon solar cells with transparent nanotextured front electrodes fabricated via ultraviolet nanoimprint lithography on glass substrates. By replicating the morphology of state-of-the-art nanotextured zinc oxide front electrodes known for their exceptional light trapping properties, conversion efficiencies of up to 12.0% are achieved for micromorph tandem junction cells. Excellent light incoupling results in a remarkable summed short-circuit current density of 25.9 mA/cm2 for amorphous top cell and microcrystalline bottom cell thicknesses of only 250 and 1100 nm, respectively. As efforts to maximize light harvesting continue, our study validates nanoimprinting as a versatile tool to investigate nanophotonic effects of a large variety of nanostructures directly on device performance.


Published in:
Nano Letters, 11, 661
Year:
2011
Publisher:
American Chemical Society
ISSN:
1530-6992
Keywords:
Note:
IMT-NE Number: 591
Laboratories:




 Record created 2011-02-03, last modified 2018-03-17

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