Journal article

High-speed laser chemical vapor deposition of copper: a search for optimum conditions

The photothermal laser-induced chem. vapor deposition of Cu was studied as a function of the writing speed, the light intensity, and the diam. of the focal spot on the substrate, at three different pressures of the Cu bishexafluoroacetylacetonate precursor. The height, the width, and the elec. cond. of the deposited metal stripes are measured. The metalorg. vapor pressure is the key variable for attaining high writing speeds. Copper stripes have been obtained at 1 mm s-1.


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