High-speed laser chemical vapor deposition of copper: a search for optimum conditions

The photothermal laser-induced chem. vapor deposition of Cu was studied as a function of the writing speed, the light intensity, and the diam. of the focal spot on the substrate, at three different pressures of the Cu bishexafluoroacetylacetonate precursor. The height, the width, and the elec. cond. of the deposited metal stripes are measured. The metalorg. vapor pressure is the key variable for attaining high writing speeds. Copper stripes have been obtained at 1 mm s-1.


Published in:
Journal of Applied Physics, 2470, 65
Year:
1989
Keywords:
Note:
Copyright 2003 ACS
CAPLUS
AN 1989:164187
CAN 110:164187
76-2
Electric Phenomena
Lab. Chim. Tech.,Ec. Polytech. Fed. Lausanne,Lausanne,Switz. FIELD URL:
Journal
JAPIAU
written in English.
Process optimization (of high-speed laser chem.-vapor deposition of copper in hybrid circuitry fabrication); Electric circuits (hybrid, optimization of high-speed laser chem.-vapor deposition of copper in fabrication of)
Laboratories:




 Record created 2011-02-01, last modified 2018-01-28


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