High-speed laser chemical vapor deposition of copper: a search for optimum conditions
The photothermal laser-induced chem. vapor deposition of Cu was studied as a function of the writing speed, the light intensity, and the diam. of the focal spot on the substrate, at three different pressures of the Cu bishexafluoroacetylacetonate precursor. The height, the width, and the elec. cond. of the deposited metal stripes are measured. The metalorg. vapor pressure is the key variable for attaining high writing speeds. Copper stripes have been obtained at 1 mm s-1.
Keywords: 14781-45-4 Role: RCT (Reactant) ; RACT (Reactant or reagent) (decompn. of ; in laser writing of copper); 7440-50-8 (Copper) Role: PEP (Physical ; engineering or chemical process) ; PROC (Process) (laser chem. vapor deposition of ; high-speed ; in hybrid circu ; copper chem vapor deposition laser optimization
Copyright 2003 ACS
Lab. Chim. Tech.,Ec. Polytech. Fed. Lausanne,Lausanne,Switz. FIELD URL:
written in English.
Process optimization (of high-speed laser chem.-vapor deposition of copper in hybrid circuitry fabrication); Electric circuits (hybrid, optimization of high-speed laser chem.-vapor deposition of copper in fabrication of)
Record created on 2011-02-01, modified on 2016-08-09