Full-field hard x-ray microscopy below 30 nm: a challenging nanofabrication achievement

The fabrication of devices to focus hard x-rays is one of the most difficult-and important-challenges in nanotechnology. Here we show that Fresnel zone plates combining 30 nm external zones and a high aspect ratio finally bring hard x-ray microscopy beyond the 30 nm Rayleigh spatial resolution level and measurable spatial frequencies down to 20-23 nm feature size. After presenting the overall nanofabrication process and the characterization test results, we discuss the potential research impact of these resolution levels.


Published in:
Nanotechnology, 19, -
Year:
2008
Publisher:
Institute of Physics
ISSN:
0957-4484
Keywords:
Laboratories:




 Record created 2010-11-30, last modified 2018-03-18


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