Resonantly Enhanced Near-Field Lithography
Tsang, Mankei; Psaltis, Demetri
2008

Abstract

We propose the combination of a planar optical resonator and a solid immersion lens for resonantly enhanced non-contact near-field lithography. Subwavelength small spots can be produced by exciting the Bessel modes of the resonator. (C) 2008 Optical Society of America

Details

Title Resonantly Enhanced Near-Field Lithography
Author(s) Tsang, Mankei ; Psaltis, Demetri
Published in 2008 Conference On Lasers And Electro-Optics & Quantum Electronics And Laser Science Conference, Vols 1-9
Pages 3495-3496
Conference Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference, San Jose, CA, May 04-09, 2008
Date 2008
Publisher Ieee Service Center, 445 Hoes Lane, Po Box 1331, Piscataway, Nj 08855-1331 Usa
Other identifier(s) View record in Web of Science
Laboratories LO
Record Appears in Scientific production and competences > STI - School of Engineering > IEM - Institut d'Electricité et de Microtechnique > LO - Optics Laboratory
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Record creation date 2010-11-25

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