Resonantly Enhanced Near-Field Lithography

We propose the combination of a planar optical resonator and a solid immersion lens for resonantly enhanced non-contact near-field lithography. Subwavelength small spots can be produced by exciting the Bessel modes of the resonator. (C) 2008 Optical Society of America


Published in:
2008 Conference On Lasers And Electro-Optics & Quantum Electronics And Laser Science Conference, Vols 1-9, 3495-3496
Presented at:
Conference on Lasers and Electro-Optics/Quantum Electronics and Laser Science Conference, San Jose, CA, May 04-09, 2008
Year:
2008
Publisher:
Ieee Service Center, 445 Hoes Lane, Po Box 1331, Piscataway, Nj 08855-1331 Usa
Laboratories:




 Record created 2010-11-25, last modified 2018-03-17


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