000154133 001__ 154133
000154133 005__ 20180913060041.0
000154133 037__ $$aPOST_TALK
000154133 245__ $$aFabrication of Heterogeneous Nanogaps for Characterizing Electrochemical Metal Deposition Processes  
000154133 260__ $$c2010
000154133 269__ $$a2010
000154133 336__ $$aPosters
000154133 520__ $$aWe present a much simpler and high-throughput method compared to mechanically break junctions (MBJ) and electro-migration, to produce a heterogeneous nanogap, directly using electron beam lithography and metal lift-off technology. Au – Pt and Au – Pt silicide electrodes pairs are fabricated using two-step electron beam lithography. The shape of the electrode apex and the distance between the electrodes are well controlled.   
000154133 700__ $$0243309$$aWu, Yexian$$g193399
000154133 700__ $$0243290$$aGautsch, Sebastian$$g190049
000154133 700__ $$aWandlowski, Thomas
000154133 700__ $$0243301$$ade Rooij, Nico$$g104887
000154133 7112_ $$a36th International Conference on Micro & Nano Engineering (MNE 2010)$$cGenova, Italy$$dSeptember 19-22, 2010
000154133 909C0 $$0252173$$pSAMLAB$$xU10329
000154133 909CO $$ooai:infoscience.tind.io:154133$$pposter
000154133 917Z8 $$x190047
000154133 917Z8 $$x190047
000154133 937__ $$aEPFL-POSTER-154133
000154133 973__ $$aEPFL$$sPUBLISHED
000154133 980__ $$aPOSTER