Growth temperatures between 450 and 520 degrees C and V/III ratios of 2-8 were explored to optimize the crystalline quality and the transport properties of compressively strained InxGa1-xAs/InP heterostructures (0.53 < x < 1). 77 K Hall mobilities as high as 118000 cm(2) V-1 s(-1) with n(s) = 1.4 x 10(12) cm(-2) were measured on structures incorporating an In0.8Ga0.2As channel grown with optimized conditions.