Comparison of the In distribution in InGaN/GaN quantum well structures grown by molecular beam epitaxy and metalorganic vapor phase epitaxy
We have compared the In distribution in InGaN quantum wells grown by molecular beam epitaxy (MBE) and metalorganic vapor phase epitaxy (MOVPE). The samples were studied by conventional and high-resolution transmission electron microscopy (HRTEM). The local and average In concentrations and the In distribution in the quantum wells were determined using the digital analysis of lattice images (DALI) method based on the evaluation of HRTEM lattice-fringe images. Similar lateral fluctuations of the In concentration were observed in MBE- and MOVPE-grown samples. The In concentration varies on a small scale (In-rich clusters with lateral extensions below 4nm) and on a larger scale of a few 10 nm, which is attributed to phase separation. In contrast, the In distribution in growth direction differs significantly in the MBE and MOVPE samples which is explained by different In-segregation efficiencies and In desorption before the GaN cap layer deposition during MBE. (C) 2003 Elsevier B.V. All rights reserved.
Keywords: metalorganic vapor phase epitaxy ; phase separation ; segregation ; transmission electron microscopy ; molecular beam epitaxy ; nitrides ; TRANSMISSION ELECTRON-MICROSCOPY ; SURFACE SEGREGATION ; FLUCTUATION
Record created on 2010-10-05, modified on 2016-08-08