Nanostructured surface fabricated by laser interference lithography to attenuate the reflectivity of microlens arrays

A subwavelength-scale square lattice optical nanostructure is fabricated using an interference photolithography process on the surface of a quartz microlens array. This nanostructuring of the quartz surface introduces an antireflective effect, reducing reflectivity between 10% and 30% and enhancing the transmissivity 3% in the visible spectrum. This approach permits fast fabrication on a 4-inch wafer covered with microlenses (non-flat surface) and produces monolithic devices which are robust to adverse environments such as temperature variations. [DOI: 10.2971/jeos.2010.10006]


Published in:
Journal of the European Optical Society, 5, 10006
Year:
2010
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 Record created 2010-02-08, last modified 2018-03-17

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