Complete Nanowire Crossbar Framework Optimized for the Multi-Spacer Patterning Technique

Nanowire crossbar circuits are an emerging architectural paradigm that promises a higher integration density and an improved fault-tolerance due to its reconfigurability. In this paper, we propose for the first time the utilization of the multi-spacer patterning technique to fabricate nanowire crossbars with a high cross-point density up to 1010 cm−2. We propose a novel decoder fabrication method that can be included in a process dedicated to the multi-spacer patterning technique. We address the technology problems consisting in the variability and fabrication complexity at the design level by optimizing the encoding scheme. We show an overall reduction of the variability by 18% and a cancelation of the fabrication complexity overhead.


Published in:
Proceedings of the International Conference on Compilers, Architecture, and Synthesis for Embedded Systems (CASES)
Presented at:
International Conference on Compilers, Architecture, and Synthesis for Embedded Systems (CASES), Grenoble, France, October 11-16, 2009
Year:
2009
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 Record created 2009-10-15, last modified 2018-09-13

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