Atomic processes during silicon oxidation: Oxygen diffusion through the oxide layer
2003
Details
Title
Atomic processes during silicon oxidation: Oxygen diffusion through the oxide layer
Author(s)
Bongiorno, A. ; Pasquarello, A.
Published in
26th International Conference on the Physics of Semiconductors
Issue
171
Pages
N3.2
Conference
Physics of Semiconductors 2002, Edinburgh, UK, 29 July-2 August, 2002
Date
2003
Laboratories
CSEA
Record Appears in
Scientific production and competences > SB - School of Basic Sciences > IPHYS - Institute of Physics > CSEA - Chair of Atomic Scale Simulation
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Peer-reviewed publications
Conference Papers
Work produced at EPFL
Published
Record creation date
2009-10-14