Oxygen species in amorphous SiO2: Relative energetics and concentration of equilibrium sites


Published in:
Materials Research Society Workshop Series, 31
Presented at:
International workshop on device technology : Alternatives to SiO2 as Gate Dielectric for Future Si-Based Microelectronics, Porto Alegre, Brazil, September 3-5, 2001
Year:
2001
Laboratories:




 Record created 2009-10-14, last modified 2018-07-07


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